E13400 - SEMI E134 - データ収集管理の仕様 StdPbc-1115 originally published June 2013

originally published June 2013

SEMI ME1392-0116 (Reapproved 1023)

SEMI M12-0706 (technical revision)

but the test method has a useful precision especially when the oxygen content is much greater (approximately 10× to 20×) than the measured oxygen background in the float zone silicon

デバイスに必要な活性な層は，イオンインプランテーションやエピタキシーによって生成される。これらの層の品質およびそれによるデバイスの性能，歩留まり，信頼性は，基板のバルク品質および表面品質に強く依存している。

E13400 - SEMI E134 - データ収集管理の仕様 StdPbc-1115 originally published June 2013global Information & Control Committee2010430global Audits and Reviews Subcommittee20106www. semi. org2004720103 Subordinate Document: SEMI E134. 1 0710 DCMSOAP Referenced SEMI Standards SEMI E30 Generic Model for Communications and Control of Manufacturing Equipment (GEM) SEMI E40 Standard for Processing Management SEMI E94 Specification for Control Job Management SEMI E120. 1 XML Schema for the Common Equipment Model SEMI E121 Guide for Style &