C00331 - SEMI C3.31 - Specification for Dichlorosilane (SiH2Cl2) in Cylinders, 99% Quality (Provisional) Revision:SEMI C3.31-1102 - Replaced Recognizing the importance of impurity

Recognizing the importance of impurity content of gases in the manufacture of semiconductors

SEMI MF657 — Test Method for Measuring Warp and Total Thickness Variation on Silicon Slices and Wafers by a Noncontact Scanning Method

CCD(電荷偶合元件)的儀器上，SEMI D31得到的公式，可用來偵測在平面顯示器中的缺陷和瑕疵。

This edition was approved for publication by the global Audits and Reviews Subcommittee on April 15

本標準經由全球平面顯示器色彩委員會之技術認可。此版本是在

C00331 - SEMI C3.31 - Specification for Dichlorosilane (SiH2Cl2) in Cylinders, 99% Quality (Provisional) Revision:SEMI C3.31-1102 - Replaced Recognizing the importance of impurityNOTICE: This document was replaced by SEMI C56 in 2005. This specification was technically approved by the Global Gases Committee and is the direct responsibility of the North American Gases Committee. Current edition approved by the North American Regional Standards Committee on August 29, 2002. Initially available at www. semi. org September 2002; to be published November 2002. Originally published in 1986; previously published in 1994. The purpose