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P02500 - SEMI P25 - Specification for Measuring Depth of Focus and Best Focus StdTpc-Process Chemicals - Precursors SEMI T7-0997E3 (editorial revision)

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SEMI T7-0997E3 (editorial revision)

orgで入手可能になり,2003年7月発行に至る。

measurements have been made on 0

This Test Method is suitable for referee measurement purposes and may be used for routine acceptance measurements when specified limits require test precision greater than can be obtained with hand held scale and unaided eye

ambient atmosphere

P02500 - SEMI P25 - Specification for Measuring Depth of Focus and Best Focus StdTpc-Process Chemicals - Precursors SEMI T7-0997E3 (editorial revision)This specification was technically approved by the Global Micropatterning Committee and is the direct responsibility of the North American Microlithography Committee. Current edition approved by the North American Regional Standards Committee on August 16, 2004. Initially available at www. semi. org September 2004; to be published November 2004. Originally published in 1994. NOTICE: This Standard or Safety Guideline has an Inactive Status because the

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