PV09100 - SEMI PV91 - Specification for Trichlorosilane Used in Polysilicon Production StdPbc-1107 本スタンダードは，global Compound Semiconductor Materials Committeeで技術的に承認されている。現版は2010年12月21日，global

本スタンダードは，global Compound Semiconductor Materials Committeeで技術的に承認されている。現版は2010年12月21日，global Audits and Reviews Subcommitteeにて発行が承認された。2011年2月にwww

For reference purposes

and without hysteresis phenomenon due to capacity effect

but are evidenced by a roughness in the originally smooth substrate which can be detected by a profilometer after the thickness measurement is completed and the layer has been etched away

SEMI F48-0600 (technical revision)

PV09100 - SEMI PV91 - Specification for Trichlorosilane Used in Polysilicon Production StdPbc-1107 本スタンダードは，global Compound Semiconductor Materials Committeeで技術的に承認されている。現版は2010年12月21日，globalThe purpose of this Document is to provide specifications for different grades of trichlorosilane that are used in polysilicon industry. With the growth of the photovoltaic market, the customers demand for quality of polysilicon is extremely high. Trichlorosilane is one of the critical raw materials of polysilicon production. The impurity content in trichlorosilane may directly impact the quality of polysilicon. The standard for trichlorosilane is to