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This document covers requirements for Dichlorosilane (SiH2Cl2) used in the semiconductor industry
Alternative methods may be used as long as they comply with SEMI C1 requirements for method validation
34-0116 (Reapproved 0922)
1 mmがすべての基板に適応する。
The purpose of this Document is to provide a specification for liquid carbon dioxide (CO2) that is used in near critical
C05700 - SEMI C57 - Specification for Argon StdTpc-Process Chemicals - Solvents This document covers requirements forThis Standard was technically approved by the Gases Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www. semiviews. org and www. semi. org in March 2017; originally published March 2005; previously published February 2011. The purpose of this Document is to provide a series of specifications for different grades of argon (Ar) that are used in the
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