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previously published January 2017
3 — Specification for 150 mm (6 inch) Port for Standard Mechanical Interface (SMIF)
Bi-Direction and multiple set and/or combination of them)
photomasks for use in optical lithography within the semiconductor industry
optical modulators
P03900 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0416 - Current previously published January 2017The purpose of this Specification is to define an interchange and encapsulation format for hierarchical integrated circuit mask layout information. Background In the fall of 2001, SEMIs Data Path Task Force formed a working group to define a successor to the venerable GDSII Stream format, which had served the I. C. industry as a de facto standard for layout interchange for more than two decades. The old format, limited by 16 bit and 32 bit internal
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