P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks StdPbc-0918 The purpose of this Document

The purpose of this Document is to provide a standardized method to quantify the accuracy

本仕様には，ウェーハIDリーダに必要な動作と必要な通信機能が含まれる。

An additional purpose of this standard is to provide sufficient information through a combination of on-line services and interface documentation that an IMMC-compliant integrated measurement module may be integrated with multi-module equipment without requiring a software change in either the module or the equipment

The Test Method is based on a light sectioning technique (see Related Information 1) where patterns of line segments or spots of light are projected onto a wafer surface and the saw marks are oriented perpendicular to the direction of wafer transport

本書はパイプラインを通して授受される水素ガスにのみ適用される。シリンダ充填ガスまたは液体状のガスには適用されない。

P04000 - SEMI P40 - Specification for Mounting Requirements for Extreme Ultraviolet Lithography Masks StdPbc-0918 The purpose of this DocumentThis Specification covers the mounting requirements for extreme ultraviolet lithography (EUVL) masks in select tools. This Standard details the requirements for EUVL mask mounting. The mask mount is a flat reference surface against which the mask is clamped. The specific design and material of the mask mount are not specified. The mounting requirements in this Standard apply to the EUV exposure tools. These mounting requirements may be used in other