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MF008100 - SEMI MF81 - Test Method for Measuring Radial Resistivity Variation on Silicon Wafers Revision:SEMI MF81-1105 - Superseded 26-84 (first published)

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26-84 (first published)

product data sheets

SEMI F31 — Guide for Bulk Chemical Distribution Systems

1) for the measurement of contamination on the wafer surface

This Test Method can be used to evaluate the failure or reduced performance of crystalline or multicrystalline silicon solar cells

MF008100 - SEMI MF81 - Test Method for Measuring Radial Resistivity Variation on Silicon Wafers Revision:SEMI MF81-1105 - Superseded 26-84 (first published)The radial resistivity variation of bulk semiconductor material is an important materials acceptance requirement for semiconductor device fabrication and is also used for quality control purposes. The four point probe method provides a test that requires little specimen preparation and that is nondestructive in that the wafer is left intact. The method can be applied to wafers using the resistivity measuring apparatus and procedures of SEMI MF84 if

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