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SEMI E5-1103 (technical revision)
• Power supply and connector
This Practice does not deal with acquisition or analysis of uniformity data where it is desired to take more than one measurement per specified spatial cell such as is commonly done for wafer site flatness measurements
The principles of this Practice may be adapted to determine the uniformity of bulk silicon wafer properties such as interstitial oxygen content and resistivity
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P00500 - SEMI P5 - Specification for Pellicles StdPbc-0415 SEMI E5-1103 (technical revision)This Specification covers the general requirements for pellicles used on photomasks or reticles in photolithographic exposure systems. This Specification covers pellicles for use in either broadband, polychromatic or monochromatic exposure systems. Referenced SEMI Standards (purchase separately) None. Revision History SEMI P5 0416 (Reapproved 1221) SEMI P5 0416 (technical revision) SEMI P5 0704 (technical revision) SEMI P5 94 (Reapproved 1103) SEMI P5
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US$ 437.00
