P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0416 - Current this Test Method requires a

this Test Method requires a pair of specified test patterns with APL variation

including shape

ウェーハ用過渡モード（Transient Mode for Wafers） — この試験方法は，厚さが1 mm以下のウェーハ形状のシリコン試料に適している。このスタンダードで記述するように，過渡モードは，過剰キャリアライフタイムが光照射の遮断時間と比較して長い場合に用いる。

This Standard applies to any company that must develop equipment training

provision is made for an associated human readable interpretation

P03800 - SEMI P39 - Specification for OASIS® – Open Artwork System Interchange Standard Revision:SEMI P39-0416 - Current this Test Method requires aThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on February 1, 2016. Available at www. semiviews. org and www. semi. org in April 2016; originally published March 2004; previously published March 2008. The purpose of this Specification is to define an interchange and encapsulation format for hierarchical integrated circuit