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1-0703 (Reapproved 1109)
SEMI E111-1104 (technical revision)
2 The GEM Standard is intended to specify the following:
SEMI C54-0624 (technical revision)
SEMI E76 — Guide for 300mm Process Equipment Points of Connection to Facility Services
MF161800 - SEMI MF1618 - Practice for Determination of Uniformity of Thin Films on Silicon Wafers Revision:SEMI MF1618-1104 - Superseded 1-0703 (Reapproved 1109)NOTICE: This Document was reapproved with minor editorial changes. The purpose of this Practice is to promote commonality of approach to the analysis of uniformity among all parties needing to generate or assess such information, including manufacturers of the basic test instrumentation to be used. This Practice is intended for process control, research and development, and process equipment evaluation purposes. It is intended for the benefit of
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