T01600 - SEMI T16 - 極紫外線マスク自動識別用データマトリクス記号法適用の仕様 Revision:SEMI T16-0706 - Superseded air flow rate and the

air flow rate and the integrity of EFFU parts should be considered simultaneously

The performance of the dimming technology affects the image quality of the display

テープフレームカセットのメカニカルインタフェースのみが規定されている。すなわち，材料の種類や清浄性については定義しない。

Radial resistivity variations are a function of the crystal growth process and dopant

and site irrigation

T01600 - SEMI T16 - 極紫外線マスク自動識別用データマトリクス記号法適用の仕様 Revision:SEMI T16-0706 - Superseded air flow rate and theNotice: This translation is a REFERENCE COPY ONLY. If differences should exist between the English version and a translation in any other language, the English version is the official and authoritative version. SEMI global Traceability Committee2006516global Audits and Reviews Subcommittee20066www. semi. org200511 EUV SEMI P37SEMI P386 6 Referenced SEMI Standards SEMI P37 Specification for Extreme Ultraviolet Lithography Mask Substrates SEMI P38