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where applicable
Recommendations given in this Document are intended for the definition and conformance of XML based standards
目的 － SECS-Iに従えば，設計者が通信する相手について詳細を知らなくとも，相互の通信を可能とする装置およびホストを設計することができる。
and analytical procedures for the gases listed in the index
The interface specification in this Document is driven by and intended to mate with a carrier compliant to the relevant SEMI 450 mm FOSB Standard
P02900 - SEMI P29 - 減衰型位相シフトマスク（ハーフトーン型位相シフトマスク）およびマスクブランクスに特有な特性の仕様 Revision:SEMI P29-1105 - Superseded where applicableglobal Micropatterning Committee200598global Audits and Reviews Subcommittee200510www. semi. org200511CD ROM19979 2005 Referenced SEMI Standards SEMI P1 Specification for Hard Surface Photomask Substrates SEMI P22 Guideline for Photomask Defect Classification and Size Definition
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