P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML Revision:SEMI P46-0706 - Superseded This Specification defines the materials

This Specification defines the materials and acceptance criteria for the components (bases

SEMI M2 — Specifications for Silicon Epitaxial Wafers for Discrete Device Applications

特定のウェーハの重要なパラメータを記載した発注書の様式の項の1つではあるが，そのウェーハの仕様書の発注書に記載されていない項に責任があるグループからの新たな追加を要求する方法。

storage or a combination of both transport and storage as perceived by a SEMI Equipment Communications Standard 2 (SECS-II) host that complies with the GEM model (as specified in § 11)

Acceptable equipment

P04600 - SEMI P46 - Specification for Critical Dimension (CD) Measurement Information Data on Photomask by XML Revision:SEMI P46-0706 - Superseded This Specification defines the materialsThis Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on September 12, 2011. Available at www. semiviews. org and www. semi. org in November 2011; originally published July 2006. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards