P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture Revision:SEMI P28-96 - Superseded This Standard defines data quality

This Standard defines data quality metrics corresponding to the Aspects

This Test Method covers a noncontacting

based on a 1986/1987 multilaboratory comparison of FT-IR instrument measurements are given in Note 6 and Related Information 2

本方法において精度を計算する意義は，マスフローコントローラ（MFC）の1人のユーザが1つのプロセスにおいてある製造装置から別の装置へと移動すること，そしてプロセスコントロールをする間に1台の製造装置内でMFCを交換することを可能にすることにある。

process module or process area) that are related to the execution of a recipe

P02800 - SEMI P28 - Specification for Overlay-Metrology Test Patterns for Integrated-Circuit Manufacture Revision:SEMI P28-96 - Superseded This Standard defines data qualityThis standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on April 25, 2007. It was available at www. semi. org in June 2007. Originally published in 1996. NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available