P02400 - SEMI P24 - CD Metrology Procedures StdPbc-0417 SEMI F27-0997 (Reapproved 1103)

SEMI F27-0997 (Reapproved 1103)

3  This Guide provides a specification framework for reporting measurements of silicon wafer surface features through the use of scanning (or automated) surface inspection systems (SSIS)

> 1 × 1014 atoms/cm3

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SEMI F60 — Test Method for ESCA Evaluation of Surface Composition of Wetted Surfaces of Passivated 316L Stainless Steel Components

P02400 - SEMI P24 - CD Metrology Procedures StdPbc-0417 SEMI F27-0997 (Reapproved 1103)This standard was technically approved by the Global Micropatterning Committee and is the direct responsibility of the North American Micropatterning Committee. Current edition approved by the North American Regional Standards Committee on July 11, 2004. Initially available at www. semi. org September 2004; to be published November 2004. Originally published in 1994. NOTICE: This Standard or Safety Guideline has an Inactive Status because the