MF039900 - SEMI MF399 - Test Method for Thickness of Heteroepitaxial or Polysilicon Layers Revision:SEMI MF399-00a (Withdrawn 0710) - Withdrawn - Historical 半導体製造工程から排出されるガス状及び粒子状汚染物質の放出を"使用点"で削減するため考えられる方法，及びそれらをある工程に使用すべき理由

半導体製造工程から排出されるガス状及び粒子状汚染物質の放出を"使用点"で削減するため考えられる方法，及びそれらをある工程に使用すべき理由

it is anticipated that most device manufacturers will require most of the GEM capabilities that apply to a particular type of equipment

여기서 정의하는 통신 서비스는 독립적인 시스템의 표준에 근거하는 상호 운용을 가능하게 하고

SEMI E16-0611 (technical revision)

SEMI T20-1108 (first published)

MF039900 - SEMI MF399 - Test Method for Thickness of Heteroepitaxial or Polysilicon Layers Revision:SEMI MF399-00a (Withdrawn 0710) - Withdrawn - Historical 半導体製造工程から排出されるガス状及び粒子状汚染物質の放出を"使用点"で削減するため考えられる方法，及びそれらをある工程に使用すべき理由This standard was originally published by ASTM International as ASTM F399 74T. It was formally approved by ASTM balloting procedures and adhered to ASTM patent requirements. Though ownership of this standard has been transferred to SEMI, it has not been formally approved by SEMI balloting procedures and does not adhere to either SEMI Regulations dealing with patents, or SEMI Style Manual. Available at www. semi. org in June 2010. Originally published