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SEMI E56 — Test Method for Determining Accuracy
SEMI E129-0709 (technical revision)
It has been replaced by SEMI C97
SEMI E80-0299 (Reapproved 1104)
SEMI M51 — Test Method For Characterizing Silicon Wafers by Gate Oxide Integrity
M01700 - SEMI M17 - Guide for a Universal Wafer Grid StdPbc-1113 SEMI E56 — Test MethodMaximum allowable slip and other non uniformly distributed defects are frequently specified when procuring polished and epitaxial silicon wafers. SEMI M62 specifies a maximum allowable fraction of the epitaxial wafer surface area that can contain slip. This Guide provides a design for and guidance for use of a wafer grid that facilitates the determination of the fraction of the wafer surface area covered by observed defects. This Guide defines a grid
