Semiconductor Metrology Instruments StdPbc-0522 org October 2003

org October 2003

buffer oxide etchants

1-1024 (first published)

oxygen plasma may be used separately or in conjunction with these techniques

5 This Standard defines the method to determine background purity (method blank) and the maximum background contaminant values acceptable for a valid test

Semiconductor Metrology Instruments StdPbc-0522 org October 2003Course Description The THORS Semiconductor Metrology Instruments course introduces the learners to the various instruments used in semiconductor testing. This course focuses on wafer inspection instruments used in semiconductor testing. This course focuses on wafer inspection systems, which are used for identifying defects, and process control metrology instruments, which are used for measuring various aspects of semiconductor manufacturing processes.