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Requirements for EPT compliance
The objective substrate range for the mask size defined by this Standard is 850 × 1
1 This Guide applies to equipment constructed for the purpose of manufacturing semiconductor devices
SEMI S8 — Safety Guidelines Equipment for Ergonomics Engineering of Semiconductor Manufacturing Equipment
注意: 本文書は，編集上の修正を伴い再承認された。
F06200 - SEMI F62 - 周囲およびガス温度の影響からマスフローコントローラ性能特性を決定する試験方法 StdPbc-0815 Requirements for EPT complianceglobal Gases Technical Committee2011912global Audits and Reviews Subcommittee201111www. semiviews. org www. semi. org2001720073 : MFCMFC Referenced SEMI Standards None.
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