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SEMI C71-0421 (technical revision)
1 (for 300 mm wafers)
approaches suitable for use in smaller facilities are outlined in Related Information 1
SEMI C40-0699 (first published)
SEMI MF391 — Test Method for Minority Carrier Diffusion Length in Extrinsic Semiconductors by Measurement of Steady-State Surface Photovoltage
E10100 - SEMI E101 - Guide for EFEM Functional Structure Model Revision:SEMI E101-1104 (Reapproved 0710) - Inactive SEMI C71-0421 (technical revision)NOTICE: This Standard or Safety Guideline has an Inactive Status because the conditions to maintain Current Status have not been met. Inactive Standards or Safety Guidelines are available from SEMI and continue to be valid for use. Productivity improvement is the task with the highest priority in semiconductor factories of the 300 mm generation, and computer integrated manufacturing or factory automation (CIM FA) technologies become more and more
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